The first objective of this research line is to control the growth of oxide thin films and nanostructures at the atomic level by investigating the growth mechanisms and kinetics at the early stage. For that purpose, we develop and use experimental means and methods for carrying in situ structural and chemical characterizations, i.e. during the synthesis. The second objective concerns advanced structural and chemical characterizations of nanostructures and nanomaterials either ex situ or in situ upon variations of external parameters (temperature, oxygen pressure, ...)
SKILLS & COMPETENCES
- Growth methods: Metal Organic Chemical Vapor Deposition (MOCVD), Atomic Layer Deposition (ALD), Chemical Bath Deposition
- Characterization techniques: X-ray Absorption, X-ray Surface Diffraction, Surface Crystallography, Substrate curvature mesurements, … Synchrotron Radiation
Investigations are conducted following 2 lines :
Understanding the growth of oxide thin films and nanostructures
Advanced structural and chemical characterization of nanostructures and nanomaterials
Contact
Permanent staff
FM2N Research topics
- Nanowires, Thin Films & Heterostructures as ...
- Wet Chemistry & Surface Functionalization
- Transparent Conducting Materials
- Physical Chemistry at Interfaces, advanced. structural characterization