The deposition of high-quality materials at low temperatures (i.e. low thermal budget) is addressed by the implementation of plasma and UV irradiation in two additional MOCVD reactors designed by the team, or by developing innovative solutions such as atmospheric Spatial ALD.
Large area deposition is achieved with the MC200 (Annealsys), where substrates of up to 200 mm in diameter can be coated. The battery of large area deposition tools is completed by spray pyrolysis, low temperature spray deposition and sol-gel apparatus.
|Plasma Assisted Aerosol Chemical Vapor Deposition reactor developed at LMGP|
Date of update February 16, 2015