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The SALD team results on the deposition of SiO2 featured in a supplementary cover of Chemistry of materials

Published on June 23, 2020
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Communique, Award from June 22, 2020 to October 20, 2020
The last results from the SALD team published in the paper "Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma"  in Chemistry of Materials have been chosen for a supplementary cover of the issue 12, Volume 32, 2020

For more info, visit the journal site
 
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Date of update June 23, 2020

  • Tutelle CNRS
  • Tutelle Grenoble INP
Université Grenoble Alpes