The SALD team results on the deposition of SiO2 featured in a supplementary cover of Chemistry of materials

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The last results from the SALD team published in the paper "Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma"  in Chemistry of Materials have been chosen for a supplementary cover of the issue 12, Volume 32, 2020

For more info, visit the journal site