Thesis defence by Carlos MONCASI LUQUE

“Structure property relationship in (La,Sr)MnO3 memristive devices”



Keywords:

Resistive Switching, Perovskite, Grain boundaries, Manganite, Epitaxial, Memristive device





cliquer pour voir la liste des membres du jury/clic here for the jury members
 

Abstract


This PhD thesis focuses on the study of the relationship between (La,Sr)MnO3 (LSM) thin film’s microstructure and their functional properties in memristive devices. Valence Change Memories (VCMs), which rely on resistive switching phenomena, are exciting candidates for the next generation of non-volatile memories as they offer fast writing speed, high storage density and low power consumption. These memories store data in the form of a tunable resistance, which can be varied by an electrical stimuli. Typically, oxygen drift within the system provokes a redox reaction, which triggers the change of resistance. However, the VCMs performance is strongly related to the elements that compose the memory, i.e. active material, electrode and their interfaces.

In this thesis, the memristive response of La1-xSrxMnO3 (LSM) perovskite oxide was studied in detail. LSM presents flexible oxygen stoichiometry accommodated through the change of Mn valence, which in turn modifies its electrical conduction properties. LSM thin films were successfully grown by pulsed-injection metal-organic chemical vapor deposition on three substrates to induce different microstructures: epitaxial films with low and high concentration of extended defects were grown on SrTiO3 (STO) and LaAlO3 (LAO) single crystals, respectively, and polycrystalline films with a large density of grain boundaries were grown on Si3N4 substrates. The memristive response was studied in micro-fabricated Ti/LSM\Pt planar devices. The formation of an oxygen deficient TiOx interlayer at the Ti/LSM interface in pristine devices was observed by STEM. Moreover, X-Ray Absorption Near-Edge Spectroscopy measurements in a pristine device indicate a strong reduction of the Mn under the Ti electrode (Mn valence ca. +2.6) while the rest of the film was oxidized (valence ca. +3.5). The reduction of LSM suggests that, during the fabrication process the TiOx is formed at the interface by scavenging oxygen from LSM.

First, the memristive performance was measured in the epitaxial samples, for which it was proven that the performance of the nanoionic devices can be boosted by microstructure engineering. Bipolar interface-type resistive switching was observed, where the transition to the high resistance state (HRS) or RESET was assigned to the drift of oxygen from LSM towards the Ti electrode (oxidizing it), while the reverse redox reaction leads to a low resistance state (LRS) via a SET process. The gradual oxidation/reduction can account for the multilevel resistance states measured in these devices. While the RESET takes place under similar conditions in LSM/LAO and LSM/STO, the SET process greatly depends on the microstructure of the LSM film. The high crystal quality of the LSM/STO epitaxial films seems to hinder the reincorporation of oxygen into LSM during the SET transition, and thus, asymmetric voltage operation is required, reaching a HRS/LRS ratio up to 7. On the other hand, in LSM/LAO devices where the extended defects act as fast migration paths to reincorporate the oxygen into LSM ,symmetric voltage operation is possible up to ±20 V with HRS/LRS up to 23.

Finally, polycrystalline Ti/LSM\Pt devices built on LSM/Si3N4 show similar behavior to that of the LSM/LAO devices, where the multilevel capacities are assigned to fast oxygen drift along the grain boundaries in both directions, i.e. during RESET and SET operation. Hence, these devices present larger operation windows, even at smaller writing voltage, i.e. HRS/LRS>10 for Vwrite=±14 V. The results obtained for polycrystalline devices are very exciting for memory applications as they are compatible with the semiconductor industry. The miniaturization of these devices is expected to lead to larger operating window and multilevel storage, while operating at lower voltages and thus, reducing power consumption.
 

Membres du jury/ Jury members :

Prof

O. Thomas

IM2NP, Aix-Marseille Université, CNRS Marseille (France)

Rapporteur

Dr

G. Dezanneau

SPMS, Université Paris-Saclay, CNRS, Gif-sur-Yvette (France)

Rapporteur

Prof

L. Buda-Prejbeanu

SPINTEC, UGA, CNRS, CEA, Grenoble (France)

Examinatrice

Dr

G. Molas

Weebit Nano Ltd., Grenoble (France)

Examinateur

Dr

M. Burriel

LMGP, CNRS, Grenoble INP Minatec, Grenoble (France)

Thesis Director



Date infos
9:30 a.m. - Amphi Z 108, Building Z
Grenoble INP Phelma-Minatec
Location infos
Grenoble INP - Phelma
3 parvis Louis Néel - 38000 Grenoble
Accès : TRAM B arrêt Cité internationale
Free entrance - No registration