Review de l'équipe SALD en collaboration avec Cambridge, Oxford et Waterloo
Le review "Spatial Atomic Layer Deposition for Energy and Electronic Devices" a été publié dans PRX Energy
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Ici vous trouverez l'article de l'équipe SALD
" Functional thin films play a critical role in efforts toward efficient devices for energy conversion and storage, as well as low-loss electronics. These films need to be manufactured at scale, cost-effectively, and with precision. Atmospheric pressure spatial atomic layer deposition (AP-SALD) has emerged as a promising technique for fulfilling these requirements. AP-SALD replicates the subnanometer control of thickness, uniformity, crystallinity, and conformality to the substrate featured in conventional atomic-layer-deposited films, but has the important advantage of depositing these films with growth rates that are orders of magnitude higher. This review discusses the opportunities and advantages that AP-SALD opens up in energy-conversion and storage devices, as well as low-loss electronics. In particular, the review features recent work on using AP-SALD-grown films for photovoltaics, light-emitting diodes, self-powered sensors, and photoelectrochemical cells and batteries, as well as in transparent conductive materials and the epitaxial growth of thin films. Perspectives on future unexplored opportunities for AP-SALD in energy and low-loss electronics are also discussed."