Séminaire LMGP - 9/03/2016- Kévin MUSSELMAN

Assistant Pr., Kevin – Musselman
University of Waterloo,

Abstract

Atmospheric pressure spatial atomic layer deposition (AP-SALD) is capable of rapidly printing nanoscale thin films in atmosphere, making it very attractive for large-scale fabrication of next-generation electronic devices. Furthermore, AP-SALD permits accurate control of film compositions, such that film properties can be engineered for specific devices. In this seminar, recent progress in the fabrication of Nb₂O₅ and Zn_(1-x)Mg_xO thin films by AP-SALD will be presented, along with their integration into next-generation photovoltaics and LEDs. Thin Nb₂O₅ interlayers were used to improve the separation of photoexcited charges in polymer solar cells, and Zn_(1-x)Mg_xO alloys were used to reduce charge injection barriers in organometal halide perovskite LEDs and polymer LEDs, resulting in record luminances.