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JIMENEZ AREVALO Maria Carmen

CNRS Research engineer in MOCVD and ALD material synthesis - Director of LMGP

Coordonnées

LMGP Grenoble-INP, Minatec 3, parvis Louis Néel CS 50257 38016 Grenoble Cedex 1 France

  • Fax : 04 56 52 93 01

  • Tél. 2 : 04 56 52 93 94

Site internet : http://

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Activités / CV

ORCID Number orcid.org/0000-0002-9601-1825

Carmen Jiménez graduated in Applied Physics at the Universidad Autónoma de Madrid and obtained her PhD degree in Physics in 1991 from the same university.She joint the LMGP in 2002.

Her main activity concerns the deposition, mainly by MOCVD or ALD, and the characterisation of thin films. She has worked in the conception of innovative MOCVD reactors in the frame of national or European projects.

She is involved in the Nanomat team and collaborates within several thematic lines, mainly in  oxides for resistive switching in collaboration with Monica Burriel. She also collaborates with the Funsurf team concerning the tranparent electrodes, silver nanowires, and thin films and nanostructures deposition methods.
She is member of the RAFALD ( Réseau des Acteurs Français de l’ALD) committee

 Publications

Marine Antibiofouling Properties of TiO2 and Ti-Cu-O Films Deposited by Aerosol-Assisted Chemical Vapor Deposition
C. Villardi de Oliveira, J. Petitbois, F. Faÿ, F. Sanchette, F. Schuster, A. Alhussein, O. Chaix-Pluchery, J.L Deschanvres and C. Jiménez
Coatings 2020, 10(8), 779, https://doi.org/10.3390/coatings10080779

Using a mixed ionic electronic conductor to build an analog memristive device with neuromorphic programming capabilities
K. Maas, E. Villepreux, D. Cooper,  C. Jiménez, H. Roussel, L. Rapenne, X. Mescot, Q. Rafhay, M. Boudard and M. Burriel
J. Mater. Chem. C, 2020,8, 464-472, https://doi.org/10.1039/C9TC03972D

Resistive switching in a LaMnO3 + δ/TiN memory cell investigated by operando hard X-ray photoelectron spectroscopy
B. Meunier, E. Martinez, R. Rodriguez-Lamas, D. Pla, M. Burriel, M.Boudard, C. Jiménez,  J-P Rueff, O. Renault
Journal of Applied Physics 126, 225302 (2019); https://doi.org/10.1063/1.5125420

Integration of LaMnO3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD
R. Rodriguez-Lamas, D. Pla, O.Chaix, B. Meunier,  F. Wilhelm, A. Rogalev, L. Rapenne, X. Mescot, Q. Rafhay, H. Roussel, M. Boudard, C. Jiménez and M. Burriel
Beilstein J. Nanotechnol. 2019, 10, 389–398. doi:10.3762/bjnano.10.38

Low-cost fabrication of flexible transparent electrodes based on Al doped ZnO and silver nanowire nanocomposites: impact of the network density
V.H Nguyen,  J. Resende,  Dorina T. Papanastasiou,  N. Fontanals, C. Jiménez,  D. Muñoz-Rojas  and  D. Bellet
Nanoscale, 2019,11, 12097-12107, https://doi.org/10.1039/C9NR02664A

Influence of the Geometric Parameters on the Deposition Mode in Spatial Atomic Layer Deposition: A Novel Approach to Area-Selective Deposition
C. Masse de la Huerta, V.H. Nguyen, J.-M. Dedulle, D. Bellet, C. Jiménez and D. Muñoz-Rojas
Coatings 2019, 9(1), 5; https://doi.org/10.3390/coatings9010005

Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
L. Tian,  S. Ponton, M. Benz, A. Crisci, R. Reboud, G. Giusti, F. Volpi, L. Rapenne, C. Vallée, M. Pons, A. Mantoux, C. Jiménez, E. Blanquet
Surface & Coatings Technology 347 (2018) 181–190

ZnO/CuCrO2 Core-Shell Nanowire Heterostructures for Self-Powered UV Photodetectors with Fast Response
Cossuet, T., Resende, J., Rapenne, L., Chaix-Pluchery, O., Jimenez, C., Renou, G., Pearson, A. J., Hoye, R. L. Z., Blanc-Pelissier, D., Nguyen, N. D., Appert, E., Munoz-Rojas, D., Consonni, V., Deschanvres, J. L.
Advanced Functional Materials 29(43), 2018, 1803142

T. Sannicolo, N. Charvin, L. Flandin, S. Kraus, D. Papanastasiou, C. Celle, JP. Simonato, D. Muñoz-Rojas, C. Jiménez, D. Bellet
Electrical Mapping of Silver Nanowire Networks: A Versatile Tool for Imaging Network Homogeneity and Degradation Dynamics during Failure
ACS Nano 12 (5) 2018, 4648-4659

C. Masse de la Huerta, V. Nguyen, JM. Dedulle, D. Bellet, C. Jiménez, D. Muñoz-Rojas
Influence of the Geometric Parameters on the Deposition Mode in Spatial Atomic Layer Deposition: A Novel Approach to Area-Selective Deposition
Coatings 9(1), 2018, 5

S. Biswas, C. Jimenez, A. Khan, S. Forissier, K. Kar, Asit, D. Muñoz-Rojas, JL. Deschanvres
Structural study of TiO2 hierarchical microflowers grown by aerosol-assisted MOCVD
CrystEngComm 19 (11), 2017,1535-1544

S. Brochen, L. Bergerot, W. Favre, J. Resende, C. Jiménez, JL. Deschanvres, V. Consonni
Effect of Strontium Incorporation on the p-Type Conductivity of Cu2O Thin Films Deposited by Metal–Organic Chemical Vapor Deposition
The Journal of Physical Chemistry C 120 (3), 2016, 17261–17267
 
Laurent Bergerot, Carmen Jiménez, Odette Chaix-Pluchery, Laetitia Rapenne, Jean-Luc Deschanvres.
Growth and characterization of Sr-doped Cu2O thin films deposited by metalorganic chemical vapor deposition
Physica status solidi (a) 212, 8,1735-1741 (2015)
DOI:10.1002/pssa.201431750

Chapters

D.  Muñoz-Rojas, V. H. Nguyen, C.Masse de la Huerta, C. Jiménez, D. Bellet
Spatial Atomic Layer Deposition in  Chemical Vapor Deposition for Nanotechnology 2018,DOI: 10.5772/intechopen.82439.

Jean-Luc Deschanvres, Carmen Jiménez
Apport de la caractérisation in situ dans les procédés ALD in Principes et applications de la technique ALD (Atomic layer deposition) de Techniques de l'Ingénieur, Réf : RE263 v1

S. Beauquis, C. Jiménez, F. Weiss
Coated Conductors and HTS Materials by chemical deposition processes in High temperature superconductivity I: Materials Ed. A.V Narkilar, Springer-Verlag Berlin Heidelberg 2004

A. Abrutis, C. Jimenéz
MOCVD "Digital" Growth of High-Tc Superconductors, Related Heterostructures and Superlattices in Recent Developments in Superconductivity Research. ED. B.P. Martin, Nova Publishers 2006.  ISBN: 1-60021-462-2

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mise à jour le 8 janvier 2021

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