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Paper by Matthieu Weber

Published on November 20, 2023
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Communique from November 2, 2023 to December 31, 2023

The paper "Atomic layer deposition (ALD) of palladium: from processes to applications" has been published in Critical Reviews in Solid State and Materials Sciences

Here you'll find Matthieu's paper
"Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, energy conversion, sensors, catalysis, membranes, and sensing devices. Thanks to the self-saturating and surface-selective nature of ALD, it allows for precise control of the amount of Pd deposited on challenging surfaces with different precursor chemistries and customizable processing conditions. This technique can produce low-dimensional nanostructures such as single atoms, nanoclusters, core/shell nanoparticles, and ultrathin continuous films. This article provides an overview of the Pd ALD processes and studies reported to date, highlighting the various precursor chemistries used and the intended applications of the prepared nanostructures. This review opens up prospects and demonstrates the potential of using Pd nanomaterials produced through ALD in real devices."
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Date of update January 8, 2024

  • Tutelle CNRS
  • Tutelle UGA
  • Tutelle Grenoble INP
Université Grenoble Alpes