MOON: an ALD/MOCVD reactor for in situ characterisation
The ANR P2N MOON project has allowed to built an ALD and MOCVD reactor specially adapted to in situ measurements
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ANR MOON Project, coordinated by Jean-Luc Deschanvres :
To increase the comprenhension and control of the growth mechanisms governing the ALD and MOCVD deposition process, the in situ characterisation techniques are a fondamental tool for research.
MOON reactor has been designed to implement several in situ characterisation techniques. This reactor provides with specifications unique in the world allowing to perform:
In a synchrotron environnement, to characterize:
- the structural properties by X ray diffraction (in plane or out of plane)
- the morphology by GISAXS
- the chemical environnement and the oxidation degree by absorption spectroscopy (XANES, EXAFS)
- the film thickness by reflectrometry or by X fluorescence
In a lab or synchrotron environnement, it is also possible to measure:
- The strain generated by the grown film by using an optical method (laser matrix)
- Photoluminescence
- the optical properties by ellipsometry
To increase the comprenhension and control of the growth mechanisms governing the ALD and MOCVD deposition process, the in situ characterisation techniques are a fondamental tool for research.
MOON reactor has been designed to implement several in situ characterisation techniques. This reactor provides with specifications unique in the world allowing to perform:
In a synchrotron environnement, to characterize:
- the structural properties by X ray diffraction (in plane or out of plane)
- the morphology by GISAXS
- the chemical environnement and the oxidation degree by absorption spectroscopy (XANES, EXAFS)
- the film thickness by reflectrometry or by X fluorescence
In a lab or synchrotron environnement, it is also possible to measure:
- The strain generated by the grown film by using an optical method (laser matrix)
- Photoluminescence
- the optical properties by ellipsometry
Publications
“SIRIUS: A new beamline for in situ X-ray diffraction and spectroscopy studies of advanced materials and nanostructures at the SOLEIL Synchrotron”
G. Ciatto, M.H. Chu, P. Fontaine , N. Aubert , H. Renevier, J.L. Deschanvres.
Thin Solid Films 617 (2016) 48–54, http://dx.doi.org/10.1016/j.tsf.2016.03.069
“An Atomistic View of the Incipient Growth of Zinc Oxide Nanolayers”,
Manh Hung Chu, Liang Tian, Ahmad Chaker, Valentina Cantelli, Toufik Ouled, Raphaël Boichot, Alexandre Crisci, Sabine Lay, Marie-Ingrid Richard, Olivier Thomas, Jean-Luc Deschanvres, Hubert Renevier, Dillon D. Fong, and Gianluca Ciatto
Crystal growth & design, 16 - 9 (2016) 5339-5348, http://dx.doi.org/10.1021/acs.cgd.6b00844
“Evolution of crystal structure during the initial stages of ZnO Atomic Layer Deposition”
R. Boichot, L. Tian, M.-I. Richard, A. Crisci, A. Chaker, V. Cantelli, S. Coindeau, S. Lay, T. Ouled, C. Guichet, M. H. Chu, N. Aubert, G. Ciatto, E. Blanquet, O. Thomas, J.-L. Deschanvres, D. D. Fong, and H. Renevier.
Chemistry of Materials, 28 – 2 (2016) 592-600, http://dx.doi.org/10.1021/acs.chemmater.5b04223