MOON: an ALD/MOCVD reactor for in situ characterisation

The ANR P2N MOON project has allowed to built an ALD and MOCVD reactor specially adapted to in situ measurements
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ANR MOON Project, coordinated by Jean-Luc Deschanvres :

To increase the comprenhension and control of the growth mechanisms governing the ALD and MOCVD deposition process, the in situ characterisation techniques are a fondamental tool for research.

MOON reactor has been designed to implement several in situ characterisation techniques. This reactor provides with specifications unique in the world allowing to perform:

In a synchrotron environnement, to characterize: 

- the structural  properties by X ray diffraction  (in plane or out of plane)
- the morphology by GISAXS
- the chemical environnement and the oxidation degree by absorption spectroscopy  (XANES, EXAFS)
- the film thickness by reflectrometry or by X fluorescence

In a lab or synchrotron environnement, it is also possible to measure:
- The strain generated by the grown film by using an optical method  (laser matrix)
- Photoluminescence
- the optical properties by ellipsometry


“SIRIUS: A new beamline for in situ X-ray diffraction and spectroscopy studies of advanced materials and nanostructures at the SOLEIL Synchrotron”
G. Ciatto, M.H. Chu, P. Fontaine , N. Aubert , H. Renevier, J.L. Deschanvres.
Thin Solid Films 617 (2016) 48–54,

 “An Atomistic View of the Incipient Growth of Zinc Oxide Nanolayers”,
Manh Hung Chu, Liang Tian, Ahmad Chaker, Valentina Cantelli, Toufik Ouled, Raphaël Boichot, Alexandre Crisci, Sabine Lay, Marie-Ingrid Richard, Olivier Thomas, Jean-Luc Deschanvres, Hubert Renevier, Dillon D. Fong, and Gianluca Ciatto
Crystal growth & design, 16 - 9 (2016) 5339-5348,

 “Evolution of crystal structure during the initial stages of ZnO Atomic Layer Deposition”
R. Boichot, L. Tian, M.-I. Richard, A. Crisci, A. Chaker, V. Cantelli, S. Coindeau, S. Lay, T. Ouled, C. Guichet, M. H. Chu, N. Aubert, G. Ciatto, E. Blanquet, O. Thomas, J.-L. Deschanvres, D. D. Fong, and H. Renevier.
Chemistry of Materials, 28 – 2 (2016) 592-600,