Aller au menu Aller au contenu
Physico chemistry of solids, thin films, biotechnologies
Applications for micro & nano- technologies, energy, health ...

> Research > Research-NanoMAT

In Situ/Operando Characterisation

The Research Line In Situ/Operando Characterization has two topics. The first one aims at mastering the growth and crystallization of ultra-thin films and nanostructures (oxides, sulfides), by the knowledge of the mechanisms at atomic and nanometric scale. To address that issue, we develop and use dedicated tools and experimental methods in order to determine chemical, spectroscopic, structural and optical information at the very onset of nucleation and as growth proceeds (ellipsometry, residual gas analysis, synchrotron radiation). The targeted processes are atomic layer deposition (ALD), as well as metal-organic chemical vapor deposition (MOCVD) and chemical bath deposition (CBD). The second topic involves advanced chemical and structural chatacterizations of nanostructures and nanomaterials that are used in an ex situ manner (after fabrication) or in an in situ manner when the effects of an external sollicaition are investigated (temperature, annealing under controlled atsmosphere, electromagnetic fields, electrochemical forces...), or in operando. The experimental characterization techniques used are mainly transmission electron microscopy, Raman spectroscopy, X-ray diffusion, X-ray absorption spectroscopy, anomalous X-ray diffraction, and photoelectron spectroscopy.

Non permanent staff

B. Chatmaneerungcharoen (PhD)
Petros Abi Younes (PhD)
Oumaima Daoudi (PhD)

5 selected publications

[5] V. Skopin et al. Nanoscale 10, 11585 (2018)
The Initital Stages of ZnO Atomic Layer Deposition on Atomically Flat In0.53Ga0.47As Substrates

[4] R. Parize et al. Materials & Design 121, 1 (2017)
In Situ Analysis of the Crystallization Process of Sb2S3 Thin Films by Raman Scattering and X-Ray Diffraction

[3] S. Guillemin et al. Nanotechnology 28, 095704 (2017)
Quantitative and Simultaneous Analysis of the Polarity of Polycrystalline ZnO Seed Layers and Related Nanowires Grown by Wet Chemical Deposition

[2] R. Boichot et al. Chemistry of Materials 28, 592 (2016)
Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

[1] M.-H. Chu et al. Crystal Growth & Design 16, 5339 (2016)
An Atomistic View of the Incipient Growth of Zinc Oxide Nanolayers

Review articles

H. Renevier et al. International Tables for Crystallography I, to be published
Diffraction Anomalous Fine Structure: Basic Formalism

H. Renevier et al. International Tables for Crystallography I, to be published
Diffraction Anomalous Fine Structure: Experiment and Data Analysis


ANR ULTiMeD (2019-2022, coordinator)
Type : Research National Agency, collaborative program call
Title : Atomic level control over ultrathin 2D layers of transition metal dichalcogenides by a molecular layer deposition route
Partnership : IPVF (Palaiseau), C2P2 (Villeurbanne), Synchrotron SOLEIL (Saint-Aubin)

ANR EMOUVAN (2016-2019, collaborator)
Type : Research National Agency, collaborative program call
Title : UV light emission with nanowires
Partnership: Institut Néel (Grenoble), LPS (Orsay), L2C (Montpellier), INAC (Grenoble)

VIGOS (2016-2017, coordinator)
Type : Labex MINOS
Title : Visualiser la croissance de couches ultra-minces de ZnO sur InGaAs pour maîtriser la résistivité de contact
Partnership : Communauté Université Grenoble Alpes

National & International collaborations

  • CEA, IRIG, Grenoble
  • CEA, LETI, Grenoble
  • BM2-D2AM, ESRF, Grenoble
  • C2P2, Villeurbanne
  • IPVF, Palaiseau
  • IN2MP, Marseille
  • Synchrotron SOLEIL, Saint-Aubin
  • ENA, Spain
  • Argonne National Laboratory, USA

Date of update March 22, 2022

  • Tutelle CNRS
  • Tutelle Grenoble INP
Université Grenoble Alpes