MOF thin-films are hybrid materials with versatile physical and chemical properties. Due to their unique structure, MOF hybrid material represent an essential components with several advantages for potential application as optoelectronics, sensing, and separation technologies.
Until recently, MOF thin films have been obtained using approaches based on the bulk synthesis. But new approaches are being developed, leading to excellent spatiotemporal control of the building blocks and good control over the thickness of the wanted films. Despite this latter advances in this field, the development of MOF thin-films is still facing many challenges, such as the general lack of understanding of growth mechanisms and the poor structural control.
In this work, we propose different approaches for the fabrication of several MOF films. Passing from the well-established MOF-CVD approach to innovative methods combining the spatial atomic layer deposition (SALD) technique with other synthesis approaches.
SALD constitutes a particular case of the more known ALD. The first is similar to the latter from a chemical point of view, but it allows to work in the open air, and it is up to two orders of magnitude faster than conventional ALD. By proper system design and optimization, SALD allows as well to have area-selective deposition (ASD) in a single step, avoiding lithography processing. This can be used to obtain patterned MOF thin films in a simple way.
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