M. D'ERCOLE Stefano

Deposition of thin-films of semiconductor oxides (ex., Ag₂O, NiO,...) via Spatial Atomic Layer Deposition (SALD) for opto-electronic applications. 
Characterisation techniques:

• X-Ray Diffraction (XRD): crystal structure, phase identification
• X-ray Photoelectron Spectroscopy (XPS): surface chemistry, oxidation state.
• Fourier Transfrom Infra-Red (FTIR) and Raman spectroscopies: identification of molecules and detection of residual ligands/precursor molecules.
• Ultra Violet-Visible spectroscopy (UV/Vis): analysis of sample's transmittance and derivation of its bandgap.
• Scanning Electron Microscope (SEM): surface morphology of the samples.
• Energy Dispersive X-ray diffraction (EDX): Identification of chemical species present in the sample.

• 3D printing/CAD: Fusion 360 to design components which are then 3D printed (mainly Stereolitography).
• Thermogravimetric Analysis (TGA): to analyse the thermal stability of the precursors and to analyse precursor's evaporation over time at constant temperature (Iso-TGA) .