SEMINAIRE LMGP - 16.11.2021 - Dr Hugo Mändar, Dr Lauri Aarik, Mahtab Salari Mehr (MSc)
“Past, present and future of atomic layer deposition in Tartu”
Dr. Hugo Mändar, Dr. Lauri Aarik, Mahtab Salari Mehr (MSc)
Laboratory of Thin Film Technology, Institute of Physics, University of Tartu, Estonia
Dr Hugo Mändar
Dr Lauri Aarik
Mahtab Salari Mehr
Abstract
We give an introduction to the history of our University, Department and Institute of Physics, and development of atomic layer deposition method at our laboratory since 80-s of last century. The thin film growth reactors and characterization methods, available now at our Institute, are briefly refereed (ALD and CVD reactors, SEM, TEM, XPS, XRD, XRF, triboindentation, spectroscopic ellipsometery, Raman spectroscopy, I-F and I-U electrical measurements). Somewhat more details we present about a special ALD reactor used for coating of inner surfaces of cylinders. The list of all ALD processes, both first time implemented by us and the known processes applied, will be highlighted. The most important results of a few recent research projects will be presented, that are related to: 1) low temperature deposition of crystalline aluminum oxide (α-Al2O3) on silicon (100) substrates using ALD deposited chromium oxide (α-Cr2O3 ) seed layer; 2) comparing of ozone and water based processes for growing of hafnium oxide (HfO2) and ternary Hf-Ti-O thin films; 3) the effect of praseodymium doping for stabilization of tetragonal HfO2: 4) growth of metastable high pressure phase of TiO2-II in form of epitaxial thin films on c-plane sapphire substrate.Infos date
Grenoble INP - Phelma
3 parvis Louis Néel - 38000 Grenoble
Accès : TRAM B arrêt Cité internationale
3 parvis Louis Néel - 38000 Grenoble
Accès : TRAM B arrêt Cité internationale
Infos lieu
14 H - Salle des Séminaires
2ème étage - LMGP
2ème étage - LMGP