Leibniz Institute for Solid State and Materials Research Dresden

From Fundamental ALD Research towards thermoelectric applications

sebastian Dr. Sebastian LehmannDr. Sebastian Lehmann

Leibniz Institute for Solid State and Materials Research Dresden

From Fundamental ALD Research towards thermoelectric applications





Abstract

Atomic layer deposition (ALD) has long been established as a powerful technique for precise thin-film growth. In this talk, I will highlight our recent progress spanning fundamental studies to emerging thermoelectric applications. This includes our work on metallic bismuth ALD, multilayer architectures based on Sb2Te3/SbO, and surface/interface modification strategies for thermoelectric powders. Together, these results demonstrate how fundamental ALD research can be translated into materials concepts that address challenges in thermoelectric device performance.

Short Bio/CV
I studied Materials Science at the Technical University of Darmstadt and completed my PhD thesis at Merck, a leading global chemical company. My doctoral research focused on synthesizing core–shell particles for high-voltage applications using wet-chemical precipitation. After defending my thesis in 2020, I joined the group of Prof. Kornelius Nielsch at IFW Dresden, where I established a laboratory for thermal ALD processes aimed at producing core–shell particles for thermoelectric applications and beyond. Since then, the lab has grown steadily, and today we operate more than 15 different ALD tools, enabling a wide range of research activities.



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14HSalle des Séminaires LMGP

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