SEMINAR LMGP - 26.05.2020 - Octavio GRANIEL TAMAYO

Liquid atomic layer deposition of metal-organic frameworks thin films

Published on 23 April 2020

- May 26

Octavio GRANIEL TAMAYO
Post-doc / LMGP

Abstract

With the advent of liquid-phase atomic layer deposition (ALD) came the prospect of an almost unlimited availability of precursors and materials that thus far had been inaccessible to gas-phase ALD. Indeed, liquid ALD has been applied successfully to the deposition of conventional gas ALD materials such as TiO₂, MgO, and SiO₂. However, its full potential has not been exploited so far as only purely organic and inorganic materials have been deposited. Therefore, we propose to expand this approach by depositing metal-organic frameworks (MOF), which are a new family of materials with a high specific surface area and well-defined pores. As a first approach, the deposition of Cu₂O and its further conversion to HKUST-1 is proposed. The microfluidic chip design criteria (e.g., material, size of the canals, pumping system) and the overall compatibility of solvents with the ALD precursors is shown.

Date infos

at 2 p.m. - by visioconference

Update - 28/04/2020