3rd year PhD student, Liam Johnston, LMGP
Grenoble INP,Univ. Grenoble Alpes, CNRS, LMGP, 38000 Grenoble, France
Spatial Atomic Layer Deposition Processes Using New Precursors
Abstract
While Spatial Atomic Layer Deposition (SALD) allows the cost-effective and fast deposition of many thin-film materials, the historical precursors used to achieve this may fail to satisfy modern requirements in environmental impact, safety, long-term availability, and cost.
In this framework, new precursors for Zn and Ga are tested as non-pyrophoric alternatives, while strategies to highly increase the efficiency of SALD are proposed to reduce the precursor waste and, as such, the economic and environmental impact of the deposition process.
Short Bio/CV
As a materials scientist with a background in applied physics, I’m currently finishing my 3rd PhD year with Prof. David Muñoz-Rojas in the FunSurf team at the LMGP on Spatial Atomic Layer Deposition.
During my training, I studied pulsed injection MOCVD with Prof. Jean-Luc Deschanvres (LMGP). I also performed short internships on Atomic Force Microscopy at the ICMM-CSIC and on the modelling of micromagnetic actuators at the Institut Néel.
My research topics of interest are computational physics, thin-film deposition engineering, and thin-film characterisation techniques.