Valentina CANTELLI, Post-doc at LMGP supported by the Nanosciences Foundation
In situ synchrotron X-ray studies of growing Si nanowires : new setup and first results
Abstract This study concerns the in-situ investigation of Si nanowires (NWs) by Grazing Incidence X-ray Diffraction (GIXD) on Si(111) and Ge(111). Si NWs show a perfect epitaxial relationship with the substrate and no difference in lattice parameters. The evolution of size and shape as well as the formation of stacking faults with respect to the different growth conditions was also monitored. Au catalyst crystallization was investigated differentiating between the top NW contribution and the substrate. GIXD studies of the heteroepitaxial growth of Si nanostructures on Ge(111) revealed the initial formation of strained silicon, followed by the growth of relaxed Si.
More infos on Valentina Cantelli
3 mars 2010 PhD graduated. Thesis on "Structural characterization of magnetron sputtered FePt thin films & nanostructures" at Helmholtz-Zentrum Dresden-Rossendorf (Dresden - Germany ) & on the Rossendorf Beamline at the European Synchrotron Radiation Facility (BM20-ROBL at ESRF).
2010-2012 : Nanosciences Foundation Post-Doc.
She has been responsible for the low pressure CVD expriment at IF-BM32 ESRF on the "In-Situ growth of Nanostructure" Ultra High Vacuum (UHV) chamber with Gilles Renaud (CEA-INAC).
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